| Place of Origin: | China |
|---|---|
| Brand Name: | Newradar Gas |
| Certification: | ISO/DOT/GB |
| Model Number: | N/A |
| Minimum Order Quantity: | 1pcs |
| Price: | negotiation |
| Packaging Details: | Packed in10L-50L cylinder or packed according to the demands. |
| Delivery Time: | 25 working days after received your payment |
| Payment Terms: | L/C, , T/T, Western Union, MoneyGram |
| Supply Ability: | 500 pcs per month |
| Product Name: | Argon Fluoride Mixtures | Filling Gas: | Argon, Neon And Fluorine Gas Mixtures |
|---|---|---|---|
| Valve Type: | CGA679 | Application: | Excimer Lasers |
| Contents: | 2000-7500L | Molar Mass: | 59.954 G/mol |
| High Light: | laser gas mixtures,msds natural gas |
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Excimer Laser Gas Argon Fluoride ArF Price Mixtures Packed in 1L - 50L Cylinders
Description:
An argon fluoride laser absorbs energy from a source, causing the argon gas to react with the fluorine gas producing argon monofluoride, a temporary complex, in an excited energy state:
2 Ar + F2 → 2 ArF
The complex can undergo spontaneous or stimulated emission, reducing its energy state to a metastable, but highly repulsive ground state. The ground state complex quickly dissociates into unbound atoms:
2 ArF → 2 Ar + F2
The result is an exciplex laser that radiates energy at 193 nm, which lies in the far ultraviolet portion of the spectrum, corresponding with the energy difference of 6.4 electron volts between the ground state and the excited state of the complex.
The light emitted by the ArF is invisible to the human eye, so additional safety precautions are necessary when working with this laser to avoid stray beams. Gloves are needed to protect the flesh from the potentiallycarcinogenic properties of the UV beam, and UV goggles are needed to protect the eyes.
Specifications:
1. Physical properties
| Commodity | Argon Fluoride gas |
| Molecular Formula | ArF |
| Phase | Gas |
| Color |
Colorless |
| Hazardous class for transort | 2.2 |
2. Typical technical data (COA)
| Major Components | |||
| COMPONENTS | CONCENTRATION | RANGE | |
| Fluorine | 1.0% | 0.9-1.0% | |
| Argon | 3.5% | 3.4-3.6% | |
| Neon | Balance | ||
| Maxinum Impurities | |||
| COMPONENT | CONCENTRATION(ppmv) | ||
| Carbon Dioxide (CO2) | <5.0 | ||
| Carbon Monoxide (CO) | <1.0 | ||
| Carbon Tetrafluoride (CF4) | <2.0 | ||
| Carbonyl Fluoride (COF2) | <2.0 | ||
| Helium (He) | <8.0 | ||
| Moisture (H2O) | <25.0 | ||
| Nitrogen (N2) | <25.0 | ||
| Nitrogen Trifluoride (NF3) | <1.0 | ||
| Oxygen (O2) | <25.0 | ||
| Silicon Tetrafluoride (SiF4) | <2.0 | ||
| Sulfur Hexafluoride (SF6) | <1.0 | ||
| THC (as Methane) (CH4) | <1.0 | ||
| Xenon (Xe) | <10.0 | ||
3. Package
| Cylinder Specifications | Contents | Pressure | ||||
| Cylinder | Valve Outlet Options | Cubic Feet | Liters | PSIG | BAR | |
| 1 | CGA679 | DISS 728 | 265 | 7500 | 2000 | 139 |
| 2 | CGA679 | DISS 728 | 212 | 6000 | 2000 | 139 |
| 3 | CGA679 | DISS 728 | 71 | 2000 | 1800 | 125 |
Applications:
Argon Fluoride Mixtures are used in 193 nm lithography applications, usually in conjunction with an inert gas mixture.
